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2011-08-11Buch DOI: 10.18452/2787
Adaptive Step-size Control in Simulation of diffusive CVD Processes
dc.contributor.authorGeiser, Jürgen
dc.contributor.authorFleck, Christian
dc.date.accessioned2017-06-15T18:18:06Z
dc.date.available2017-06-15T18:18:06Z
dc.date.created2011-08-11
dc.date.issued2011-08-11
dc.identifier.issn0863-0976
dc.identifier.urihttp://edoc.hu-berlin.de/18452/3439
dc.description.abstractIn this paper, we present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates. In the models, we discuss the application of different models to simulate the plasma-transport of chemical reactants in the gas-chamber. The contribution are an optimal control problem based on a PID control to obtain an homogeneous layering. We taken into account one- and two-dimensional problems, that are given with constraints and control functions. A finite element formulation with adaptive feedback control for time-step selection has been developed for the diffusion process. The optimization is presented with efficient algorithms. Numerical experiments are discussed with respect to the diffusion processes of the macro-scopic model.eng
dc.language.isoeng
dc.publisherHumboldt-Universität zu Berlin, Mathematisch-Naturwissenschaftliche Fakultät II, Institut für Mathematik
dc.subjectChemical vapor depositioneng
dc.subjectmulti-scale problem diffusion equationseng
dc.subjectPID controleng
dc.subject.ddc510 Mathematik
dc.titleAdaptive Step-size Control in Simulation of diffusive CVD Processes
dc.typebook
dc.identifier.urnurn:nbn:de:kobv:11-100190757
dc.identifier.doihttp://dx.doi.org/10.18452/2787
local.edoc.container-titlePreprints aus dem Institut für Mathematik
local.edoc.pages27
local.edoc.type-nameBuch
local.edoc.container-typeseries
local.edoc.container-type-nameSchriftenreihe
local.edoc.container-volume2008
local.edoc.container-issue8
local.edoc.container-year2008
local.edoc.container-erstkatid2075199-0

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