Browsing Preprints aus dem Institut für Mathematik by Author "Arab, M."

Now showing items 1-3 of 3

2011-09-27Buch

Model of PE-CVD apparatus

Geiser, Jürgen; Buck, V.; Arab, M.

In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. For chemical vapor deposition, the delicate optimization between temperature, pressure and plasma power is important to ...
2011-09-27Buch

Porous Media Based Modeling of parallel Plate PE-CVD Apparatus

Geiser, Jürgen; Arab, M.

The numerous technical applications in deposit metal plates with new materials like SiC and TiC has an advantage to overcome the leaking corrosive behavior and have additional a good electrical behavior. Here we present ...
2011-08-17Buch

Simulation of a Chemical Vapor Deposition

Geiser, Jürgen; Arab, M.

We are motivated to model chemical vapor deposition for metallic bipolar plates and optimization to deposit a homogeneous layer. Moreover a constraint to the deposition process is a very low pressure (nearly vacuum) and a ...