Browsing Preprints aus dem Institut für Mathematik by Subject "Chemical vapor deposition"

Now showing items 1-6 of 6

2011-08-11Buch

Adaptive Step-size Control in Simulation of diffusive CVD Processes

Geiser, Jürgen; Fleck, Christian

In this paper, we present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates. In the models, we discuss the application of different models to simulate the plasma-transport ...
2011-09-27Buch

Model of PE-CVD apparatus

Geiser, Jürgen; Buck, V.; Arab, M.

In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. For chemical vapor deposition, the delicate optimization between temperature, pressure and plasma power is important to ...
2011-08-11Buch

Modeling for Chemical Vapor Deposition

Geiser, Jürgen

In this paper we present modeling and simulation for chemical vapor deposition (CVD) on metallic bipolar plates. In the models we discuss the application of different models to simulate the plasma-transport of chemical ...
2011-08-11Buch

Modeling for Chemical Vapor Deposition

Geiser, Jürgen

In this paper we present the modeling and simulation of a chemical vapor deposition for metallic bipolar plates. In the models we discuss the application of different ideas to simulate the transport of chemical reactants ...
2011-08-17Buch

Simulation of a Chemical Vapor Deposition

Geiser, Jürgen; Arab, M.

We are motivated to model chemical vapor deposition for metallic bipolar plates and optimization to deposit a homogeneous layer. Moreover a constraint to the deposition process is a very low pressure (nearly vacuum) and a ...
2011-08-11Buch

Transport and Chemical Reaction

Geiser, Jürgen; Jamneshan, Asgar

In this paper we present computational schemes for solving transport and chemical reaction processes. The model is based on a convection-diffusion-reaction equation which models our fluid dynamics of the deposition process. ...