2011-09-27Buch
Monte Carlo simulations concerning modeling DC and high power pulsed magnetron sputtering for Ti₃SiC₂ including high pressures and ion deposition probabilities
Geiser, Jürgen
We motivate our study by simulating the particle transport of a thin film deposition process done by PVD (physical vapor deposition) processes. In this paper we present a new model taken into account a higher pressure ...